Improvement on Surface and Electrical Properties of Polymer Insulator Coated TiO2Thin Film by Atomic Layer Deposition
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چکیده
منابع مشابه
Electrical and optical properties of Al-doped ZnO and ZnAl2O4 films prepared by atomic layer deposition
ZnO/Al2O3 multilayers were prepared by alternating atomic layer deposition (ALD) at 150°C using diethylzinc, trimethylaluminum, and water. The growth process, crystallinity, and electrical and optical properties of the multilayers were studied with a variety of the cycle ratios of ZnO and Al2O3 sublayers. Transparent conductive Al-doped ZnO films were prepared with the minimum resistivity of 2....
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We investigate the optical and thermo-optical properties of amorphous TiO2–Al2O3 thin-film bilayers fabricated by atomic layer deposition (ALD). Seven samples of TiO2–Al2O3 bilayers are fabricated by growing Al2O3 films of different thicknesses on the surface of TiO2 films of constant thickness (100 nm). Temperature-induced changes in the optical refractive indices of these thin-film bilayers a...
متن کاملAtomic layer deposition of Zn(O,S) thin films with tunable electrical properties by oxygen annealing
Zinc oxysulfide, Zn(O,S), films grown by atomic layer deposition were annealed in oxygen to adjust the carrier concentration. The electron carrier concentration of Zn(O,S) can be reduced by several orders of magnitude from 10 to 10 cm 3 by post-deposition annealing in oxygen at temperatures from 200 C to 290 C. In the case of Zn(O,S) with S/Zn1⁄4 0.37, despite the considerable change in the ele...
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ژورنال
عنوان ژورنال: Journal of the Korean Institute of Electrical and Electronic Material Engineers
سال: 2016
ISSN: 1226-7945
DOI: 10.4313/jkem.2016.29.7.440